Optimal for epitaxial growth: oxide substrates for thin film growth
Consistent production from crystal growth to processing in-house. High-quality crystal substrate surfaces without processing distortion.
【Optimal for Epitaxial Growth】 Oxide substrates for thin film growth have been contributing to advancements in science and technology since the 1980s, providing substrates such as SrTiO3 and sapphire for high-temperature superconducting thin films and GaN. For epitaxial growth substrates, the crystal quality, surface smoothness, flatness, and the presence or absence of crystal lattice strain at the very surface are crucial. Our company has achieved consistent in-house production from crystal growth to processing through years of technological accumulation. With our high-precision processing technology, we continue to provide high-quality crystal substrate surfaces. We always keep standard specifications in stock and deliver them within approximately 10 days after order placement. We also offer custom-made options for surface orientation, shape, and off-angle according to your needs, so we handle products with specifications not listed in our lineup. Please feel free to contact us. *For more details, please inquire or refer to our catalog.*
- Company：信光社
- Price：Less than 10,000 yen
